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Availability: In stock

Wang resin (200-400 mesh, 0.80-1.20 mmol/g)
4-Alkoxybenzyl alcohol resin


Product No. Pack Size Available ADS InfoAnalytical Data Sheet List Price Online Order Price Qty
4003214.0005 5 g Ships within 1 business day ADSExemplary Data Sheet of a current available lot.
CHF 73.00
CHF 67.89 (7%)
4003214.0025 25 g Ships within 1 business day ADSExemplary Data Sheet of a current available lot.
CHF 252.00
CHF 234.36 (7%)
4003214.0100 100 g Ships within 3-5 business days  
CHF 767.00
CHF 713.31 (7%)


The Wang support, p-benzyloxybenzyl alcohol resin, is the most widely used resin for attaching carboxylic acids for further functionalization. Cleavage conditions for the ester anchor involve concentrated TFA or TFA/CH₂Cl₂ to provide carboxylic acids or cyclization-cleavage under acidic or basic conditions. Release of an amide function by treatment with an amine in the presence of a Lewis acid was also reported. Wang resin was used to add vinyl and iodobenzoic acids via carbodiimide coupling and the products subjected to Heck conditions with alkenes or with alkynes or to Suzuki coupling with boron reagents. The Ugi multicomponent condensation reaction was conducted on Wang resin with the carboxylic acid, amine or isonitrile as the anchored functional group. Solid-phase lactam syntheses were also achieved by reaction of the resin-bound isonitrile with an amine and an ω-keto-acid as well as other synthetic transformations such as the Biginelli reaction and construction of heterocycles such as quinolones, imidazoles, hydantoins, and 1,4-benzodiazepine-2,5-diones. On a Wang resin primary, secondary, and tertiary alcohols have been converted to 4-methoxybenzyl ethers. As well as anchoring carboxylic acids to Wang resin, phenols were attached under Mitsunobu conditions, subjected to further transformations and cleaved under acidic conditions.
Catalog Number D-1250
Synonyms 4-HOCH₂-Ph-O-CH₂-Ph-polymer, 4-Benzyloxybenzyl alcohol resin, p-Alkoxybenzyl alcohol resin
Molecular Formula n/a
Relative Molecular Mass n/a
Storage Conditions RT